Hierarchically patterned polyurethane microgrooves featuring nanopillars or nanoholes for neurite elongation and alignment

• Lester Uy Vinzons,
• Guo-Chung Dong and
• Shu-Ping Lin

Beilstein J. Nanotechnol. 2023, 14, 1157–1168, doi:10.3762/bjnano.14.96

• further crosslinking the SU-8 (Figure 1A(iv)). This enabled the release of the PDMS film without breakage of the nanopillars (Supporting Information File 1, Figure S1D). Application of NLL on the positive photoresist AZ1518 allowed for the formation of a nanohole array (Figure 1A(v)). AZ1518 contains a

• crosslinked the imprinted SU-8 layer (Figure 1A(vi) and (vii)), resulting in a “reinforced” nanohole array (Figure 1A (viii)). Using these “reinforced” photoresist masters, PDMS replica molding and PU solvent casting allowed for the creation of the PU nanopillar and nanohole substrates (Figure 1B and

• cone filopodia also appear to extend towards nanopillars on the flat base areas. On the nanohole array (Figure 2I), the neurites and growth cones passed between and over the holes. However, the growth cone filopodia passed along the spaces and edges between the holes without being suspended across the

Fabrication of nano/microstructures for SERS substrates using an electrochemical method

• Jingran Zhang,
• Tianqi Jia,
• Xiaoping Li,
• Junjie Yang,
• Zhengkai Li,
• Guangfeng Shi,
• Xinming Zhang and
• Zuobin Wang

Beilstein J. Nanotechnol. 2020, 11, 1568–1576, doi:10.3762/bjnano.11.139

• factor of R6G molecules on the pyramid structure was about 105. Wu et al. [26] machined nanohole array structures using EBL and lift-off methods. The diameter of the nanoholes ranged from 90 to 585 nm, and the gap between adjacent nanoholes ranged from 125 to 585 nm. An enhancement factor of 8 × 106 was

Refractive index sensing and surface-enhanced Raman spectroscopy using silver–gold layered bimetallic plasmonic crystals

• Somi Kang,
• Sean E. Lehman,
• Matthew V. Schulmerich,
• An-Phong Le,
• Tae-woo Lee,
• Stephen K. Gray,
• Rohit Bhargava and
• Ralph G. Nuzzo

Beilstein J. Nanotechnol. 2017, 8, 2492–2503, doi:10.3762/bjnano.8.249

• -sized features of the metallic structures. The appropriate optical constants for each material and the geometrical model of the periodic nanohole array are crucial for FDTD modeling because all of the plasmonic modes are highly sensitive to the structural details and dielectric properties of the

• through the flow cell [37]. Integrated multispectral RI responses of five full-3D PCs with different mass-coverage metal films were measured to investigate and validate the best design for the PC for bulk RI sensing. To determine an optimal nanohole array design for RI sensing in the visible wavelength

• geometries are identical. We therefore selected the p580 nanohole array as a suitable exemplar for the bulk RI sensitivity evaluation of bimetallic PCs carried out in this study. Figure 3a shows the integrated responses of five full-3D PCs selected for a design rule giving optimal RI responses with different

Graphene-enhanced plasmonic nanohole arrays for environmental sensing in aqueous samples

• Christa Genslein,
• Peter Hausler,
• Eva-Maria Kirchner,
• Rudolf Bierl,
• Antje J. Baeumner and
• Thomas Hirsch

Beilstein J. Nanotechnol. 2016, 7, 1564–1573, doi:10.3762/bjnano.7.150

• the nanohole array surface. Furthermore, a reduced graphene oxide (rGO) sensor surface was layered over the nanohole array. Reduced graphene oxide is a 2D nanomaterial consisting of sp2-hybridized carbon atoms and is an attractive receptor surface for SPR as it omits any bulk phase and therefore

• allows fast response times. In fact, it was found that nanohole arrays demonstrated a higher shift in the resonance angle of 250–380% compared to a continuous gold film. At the same time the nanohole array structure as characterized by its diameter-to-periodicity ratio had minimal influence on the

• binding capacity of the sensor surface. As a simple and environmentally highly relevant model, binding of the plasticizer diethyl phthalate (DEP) via π-stacking was monitored on the rGO gold nanohole array realizing a limit of detection of as low as 20 nM. The concentration-dependent signal change was

Sub-10 nm colloidal lithography for circuit-integrated spin-photo-electronic devices

• Adrian Iovan,
• Marco Fischer,
• Roberto Lo Conte and
• Vladislav Korenivski

Beilstein J. Nanotechnol. 2012, 3, 884–892, doi:10.3762/bjnano.3.98

• and Al). Figure 4 shows SEM images of a typical nanohole array mask. Long-range order is maintained over the micrometre range, as shown in Figure 4a and b. The process was repeated many times and showed good reproducibility. The average interdot distance is 200 nm, corresponding to the original

• detailed above to form a nanohole array mask on the bottom electrode surface. Plasma RIE with CF4 is used for 2 min for making the contact through the 15 nm thick SiO2 with the 180 nm thick bottom electrode of Al. The etching time for 15 nm of SiO2 is 1 min. Using the chemical selectivity of CF4 to etch